GLOSSARY ENTRY (DERIVED FROM QUESTION BELOW) | ||||||
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15:42 Feb 23, 2005 |
English to Hungarian translations [PRO] IT (Information Technology) | |||||||
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| Selected response from: Hungi (X) Local time: 12:51 | ||||||
Grading comment
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Summary of answers provided | ||||
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5 +1 | számítógép szoftver és félvezető topográfiák |
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4 | Számítógépes szoftver és maszk tervek |
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4 | maszkminta |
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Számítógépes szoftver és maszk tervek Explanation: The United States Code defines a mask work as "a series of related images, however fixed or encoded, having or representing the predetermined, three-dimensional pattern of metallic, insulating, or semiconductor material present or removed from the layers of a semiconductor chip product, and in which the relation of the images to one another is such that each image has the pattern of the surface of one form of the semiconductor chip product" (17 USC § 901 (a) (2)). Mask work exclusive rights were first granted in the US by the Semiconductor Chip Protection Act of 1984. In Canada these rights are protected under the Integrated Circuit Topography Act (1990, c. 37). |
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számítógép szoftver és félvezető topográfiák Explanation: Ez a hivatalos neve a törvényben is, és a gyakorlatban is. |
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maszkminta Explanation: A szilíciumlapkák gyártásánál használnak maszkokat, az egyes rétegek készítésekor a fotóeljárásnál. Itt abban az értelemben használják, hogy az így létrejött mintázat elvileg egyedi lenne (pedig nem feltétlenül az, ugyanazt a feladatot többféle áramkörrel is meg lehet valósítani, ld. a mellékelt linket), de mindenképpen szellemi tulajdon. Reference: http://www.baypatents.com/faq_display.asp?faq_id=34 |
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